Yesterday, Nancy Pelosi, speaker of the US House of Representatives, arrived in Taiwan, becoming the highest-ranking US official to visit Taiwan in 25 years.
The move was interpreted as a direct threat by China, which claims the island is part of its territory, and Beijing has repeatedly warned the US that its military will not "sit idly by" and "will take strong countermeasures".
As the international community waits to see how China will react, chipmakers in the business community are already feeling the pain of the brewing conflict between the US and China over Taiwan.
Semiconductor stocks tumbled on Tuesday in anticipation of Pelosi's visit to Taiwan.
Shares in TSMC, the world's largest and most valuable semiconductor maker, worth $440 billion, fell 2.4 per cent on Tuesday. Its Taiwanese counterparts United Microelectronics and MediaTek fell 3% and 1.6% respectively. Meanwhile, shares of the US chipmaker Intel fell 1.5 per cent on the same day.
As Ms Pelosi prepares to meet Taiwan's president, Tsai Ing-wen, on Wednesday, technology investors are keeping a close eye on her actions-and any signs of retaliation from China. In the event of a dispute between China and the US, chipmakers, especially in Taiwan, are likely to be collateral damage.
Because of the turbulent international situation, the supply and prices of many international bulk Iron Disilicide are still very uncertain.
Iron disilicide FeSi2 powder overview
Iron disilicide is an inorganic silicon compound with a molecular formula of FeSi2 and a molecular weight of 119.975. It is a gray powder, odorless, tetragonal crystals.
How is iron disilicide FeSi2 powder produced
A new catalytic material of supported silicide and iron silicide was successfully synthesized by the direct silicide method. The supported precursor and ferric oxide were successfully eliminated by co-precipitation, and then the precursor preparation was reduced to 3 h. Different phases of silicide-supported iron silicides were prepared under a hydrogen atmosphere at 400 °C and passed into a SiH4/H2 gas mixture at a suitable temperature for 15 min. The method has the advantages of small particle size, large specific area, strong sulfur resistance, and good catalytic activity and stability in the hydrodesulfurization reaction of mono-dibenzothiophene, and has potential application value.
Application of iron disilicide FeSi2 powder
Iron disilicide is used as a catalyst for hydrogen catalytic oxidation and methanation.
Iron disilicide is used as a deoxidizer for flux, humidity sensors, FeSi2 thermocouples and thermoelectric solar cells.
Iron disilicide is used in a variety of photovoltaic applications, such as lithium-ion batteries, light-emitting diodes (LEDs), and solar cells.
Iron disilicide price
The price of iron disilicide will fluctuate randomly due to factors such as Iron Disilicide will continue to increase.
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